Interactive visualization of PN junction physics, energy bands, and I-V characteristics
A PN junction is formed by joining P-type and N-type semiconductors. The P-type region has an excess of holes (positive charge carriers) from acceptor doping, while the N-type region has an excess of electrons (negative charge carriers) from donor doping. At the junction, carriers diffuse across the boundary, creating a depletion region with an built-in electric field that opposes further diffusion.
Carrier Diffusion: When P and N materials are joined, concentration gradients cause holes to diffuse from P to N and electrons from N to P.
Depletion Region: As carriers diffuse, they leave behind ionized dopants (negative acceptors in P, positive donors in N), creating a space charge region depleted of mobile carriers.
Built-in Potential: The space charge creates an electric field and a potential barrier (V_bi ≈ 0.7V for Si) that balances diffusion and drift currents at equilibrium.
Energy Bands: The bands bend near the junction, with conduction and valence bands higher in the N-region by e·V_bi, keeping the Fermi level constant.
Forward Bias (V > 0): Positive voltage applied to P-region reduces the barrier height, allowing large currents to flow exponentially (I ∝ e^(eV/kT)). Used in LEDs, rectifiers.
Reverse Bias (V < 0): Negative voltage on P-region increases the barrier, widening the depletion region. Only small leakage current flows (minority carrier drift).
Breakdown: At large reverse voltage, avalanche multiplication or Zener tunneling causes sudden current increase. Avalanche breakdown occurs in higher-doped junctions (> 6V), Zener in heavily-doped (< 4V).